7.1: A Microsystems Enabled Field Desorption Source


P. J. Resnick, C. E. Holland, P. R. Schwoebel, K. L. Hertz and D. L. Chichester, “7.1: A microsystems enabled field desorption source,” International Vacuum Nanoelectronics Conference, Palo Alto, CA, USA, 2010, pp. 104-105, doi: 10.1109/IVNC.2010.5563205.


Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.

Keywords: Logic gates, Silicon, Dielectrics, Substrates, Fabrication, Electrodes

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